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INŻNIERIA POWIERZCHNI NR 4 – 2007

MAREK BETIUK
1, KRYSPIN BURDYŃSKI1

THE TiAlC SYNTHESIS PROCESS ASSISTED BY PLASMA SPECTRAL EMISSION SIGNAL CONTROLLING


SUMMARY
The possibility to obtain the TiAlC coatings by chemical plasma reactions between titanium ions and metaloorganic precursors (which contain an aluminum) is showed in this paper. Aluminum content in coatings of this type has a huge influence on their mechanical and chemical properties. In our studies of MO PVD technology we were focused on registration of spectral emission lines signals from Al+ and Ti+ ions and of chemical composition of occurred phases. This kind of synergism was analyzed. We tried to predict a possibility of application computer control of the plasma synthesis process. The main aim of our study was to work out plasma synthesis process of TiAlC coatings with plasma spectral emission signal control. Fundamental parameters like: pressure, chemical composition of atmosphere were investigated during the MO PVD processes because this factors have significant influence on phase and chemical structure of deposited coatings.

Keywords
MOPVD, TiAlC, plasma analyze.


1 Instytut Mechaniki Precyzyjnej, Warszawa